Paper Overview
- Field: ML / Materials Informatics
- Authors: Sameer Sadruddin, Eleni Poupaki, Alex Watkins, Bora Karasulu, Adriaan J. M. Mackus, Erwin Kessels, Sören Auer, Jennifer D'Souza
- arXiv: 2609.12139
- Four JSON Schemas covering ALD and ALE processes, for both experimental and simulation workflows.
- Domain-expert review ensures the schemas reflect real laboratory and computational practice.
- Semantic grounding in QUDT units/quantities via the schema-miner pro pipeline.
- Demonstration of schema-guided extraction from scientific literature and structured publication via ORKG templates.
Abstract
Atomic layer deposition (ALD) and atomic layer etching (ALE) are reported heterogeneously across experimental and simulation literature in materials science, hindering comparison and machine-actionable reuse. The authors present four domain-expert-reviewed JSON Schemas for ALD and ALE experimental and simulation processes. Curated with schema-miner and grounded in QUDT using schema-miner pro, the schemas structure materials, process conditions, configurations, and measured or predicted results. The paper compares their scope, structure, and semantic grounding, and demonstrates their use for schema-guided literature extraction and publication of structured records through ORKG templates.
Key Contributions
Why It Matters
Standardized, machine-actionable process records make ALD/ALE literature comparable and reusable, supporting large-scale meta-analysis, benchmarking, and AI-driven materials discovery.
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